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Undergraduate course on semiconductor device Physics-II
Rating: 4.8 out of 5(21 ratings)
426 students

Undergraduate course on semiconductor device Physics-II

Quantitative & Qualitative analysis of MOS capacitor, MOSFET and BJT
Last updated 3/2022
English

What you'll learn

  • MOS Capacitor quantitative analysis
  • MOSFET quantitative and Qualitative treatment
  • BJT analysis
  • Mathematical understanding

Course content

3 sections79 lectures9h 31m total length
  • Lesson-01 MOS Introduction4:37

    Explore the metal-oxide-semiconductor capacitor, a three-layer structure that behaves like a parallel-plate capacitor, with area-based capacitance given by permittivity over distance under applied voltage.

  • Lesson-02 Energy band theory of MOS- Flat band condition5:25
  • Lesson-03 Work function difference & Electron affinity7:05
  • Lesson-04 Accumulation mode in energy bands9:50

    Explore how negative bias on a metal contact drives hole accumulation at the semiconductor surface, bending energy band structure and forming a charge distribution at the metal insulator semiconductor interface.

  • Lesson-05 Depletion mode in energy bands10:56
  • Lesson-06 Inversion mode in energy bands3:25
  • Lesson-07 Inversion mode in energy band structure5:37
  • Lesson-08 Surface potential5:53

    Examine surface potential, its link to equilibrium and intrinsic Fermi levels, and the onset of strong inversion, while connecting electrostatic potential to electron and hole concentrations.

  • Lesson-09 On set of strong inversion12:01

    Describe the onset of strong inversion as the inversion-layer carrier concentration reaching the substrate's majority carrier concentration, with band bending and increased electron density in the inversion layer.

  • Lesson-10 Surface potential-Summary9:56
  • Lesson-11 Maximum depletion width- Mathematical analysis11:27
  • Lesson-12 Ideal MOS curves- Charge density6:49
  • Lesson-13 Ideal MOS curves- Field intensity & Potential6:34

    Analyze ideal MOS curves by linking constant oxide-field and linearly varying semiconductor field to oxide and surface potentials, noting inversion-layer charge and the resulting linear-to-parabolic potential profile.

  • Lesson-14 MOS C-V characteristic curve-I10:40
  • Lesson-15 MOS C-V characteristic curve-II9:05
  • Lesson-16 MOS capacitor with n-substrate4:03
  • Lesson-17 Solved Example-014:29

    Compute the maximum depletion width wmax in silicon by relating surface potential, acceptor and intrinsic concentrations, and permittivity, then evaluate with the given values to obtain wmax ≈ 1.4×10^-5 cm.

  • Lesson-18 Solved Example-025:02
  • Lesson-19 Threshold voltage & Inversion charge7:54
  • Lesson-20 Non ideal conditions in MOS capacitor7:06

    Explore non-ideal conditions in a MOS capacitor, including non-zero work function difference and oxide interface effects, and the resulting internal fields, Fermi level alignment, depletion, toward flat-band.

  • Lesson-21 Non zero work function difference4:32
  • Lesson-22 Oxide charges & Interface traps6:25
  • Lesson-23 Threshold voltage under non ideal conditions7:34
  • Lesson-24 Solved example-033:11

    Compute the metal-semiconductor work function difference under non-ideal conditions using modified work function and modified electron affinity with silicon doping data. Derive the barrier potential at the metal-semiconductor interface.

  • Lesson-25 Solved example-042:59

Requirements

  • My previous course- "Undergraduate course on semiconductor device physics-II"

Description

This is an undergraduate course on semiconductor device physics. This course is the second part in a series of two courses on semiconductor device physics.

For any electronics student understanding transport phenomena of charge carriers, drift current, diffusion current, energy band theory of semiconductors, electron hole pairs(EHPs), Junction formation in a diode, extending the device physics to three terminal devices like BJT and MOSFET is necessary. 

My previous course "undergraduate course on semiconductor device physics-I" is a prerequisite for complete understanding of this course.

Metal-Oxide-Semiconductor combination forms a capacitor and that capacitive action is to be understood well in terms of threshold voltage, CV characteristics. Though our major focus is on ideal MOS capacitor, non-idealities are also discussed up to some extent.

Based on the knowledge of MOS capacitor, if we look at the transport of charge carriers in a three terminal device MOSFET it gives a complete picture of all MOSFET transistor structures namely, enhancement MOSFET & depletion MOSFET in both p-type and n-type substrates. A MOSFET is explained up to threshold control.

Another transistor is Bipolar junction transistor(BJT). BJT characteristics and device parameters are explained with respect to input and output characteristics.

About Author:

Mr. Udaya Bhaskar is an undergraduate university level faculty and GATE teaching faculty with more than 15 years of teaching experience. His areas of interest are semiconductors, electronic devices, signal processing, digital design and other fundamental subjects of electronics.  He trained thousands of students for GATE and ESE examinations.

Who this course is for:

  • Undergraduate students in electronics engineering, Communication engineering