Introduction to Micro and Nano fabrication Techniques

This video explains the basics of lithography systems and focuses on the state of art deep ultraviolet photolithography process.

This lecture explains the current techniques used for resolution enhancement, including: optical proximity correction (OPC), Off-axis illumination (OAI), Phase-shift masking (PSM), Immersion lithography, double patterning, and spacer etching.

This video introduces Extreme UV lithography, the most promising next-generation lithography techniques, highlighting its pros and cons.

This video highlights the importance of oxidation process and explains the concept of thermal oxidation

Following the last lecture, this video shows the alternative way of depositing oxide layers through chemical vapor deposition, and briefly compares thermally grown and deposited oxide layers.

This lecture highlights the importance of doping. Then, it explains the basic principles and doping profile of the diffusion process

In this lecture, the ion implantation technique is explained. Followed by a comparison between diffusion and ion implantation.

This video explains the etching process and major figures of merits. Followingly, wet etching is explained.

This video explains the basic concept of dry etching with a special focus on deep reactive-ion etching (DRIE)

In this module, we are introducing different deposition techniques. This video focuses on chemical vapor deposition and the usage of plasma to compensate for the high temperature. 

This video explains the basic idea behind atomic layer deposition (ALD), and why it has superior control over the film thickness

This short video explains the basic principle of sputtering process and sputtering yield

This video explains the idea behind thermal evaporation and how it can be used in the deposition of metals.

In this video we have reviewed the different deposition techniques, and investigated the practicality of each and their common applications

This video explains the meaning and significance of epitaxial growth

This video introduces the approach used in depositing different metals and some special flows as Damascene process and Silicidation. Additionally, practical aspects of metalization as electromigration and Aluminum spiking are explained.

This lecture introduces the most common planarization technique, which is chemical-mechanical polishing (CMP)

This video shows how the different microfabrication methods are integrated into a single flow to make a CMOS inverter.

This video introduces the idea of process flow simulation, and we went through the simulation of fabricating Si PN junction. The tool used in Simulation is Synopsis TCAD, mainly Sprocess.